We demonstrated that the kernel factor was to precisely control t

We demonstrated that the kernel factor was to precisely control the ratio of the lateral and vertical etching rate to achieve the desirable geometries. Effective and extreme tailoring of the

diameter of the PS nanosphere mask played a crucial role in achieving the controllable nanogaps between these nanostructures, which could be below 10 nm or even at point contact between two adjacent nanostructures. Applying the reliable 3D nanostructures as tunable SERS substrates, we extensively study influences of geometries, nanogaps, and the adhesion layer between the desirable noble metal and the underlying quartz substrate on SERS enhancement effect. Negative contribution of adhesive layer was demonstrated according to the results of SERS enhancement factors. The tunable SERS substrates possess great advantages: (1) achieving strong average SERS enhancement factor up to selleck kinase inhibitor 1011; (2) free-adhesion layer; (3) a platform for any desirable metal, and can be reused by simply removing and redepositing the metal film while not destructing the 3D nanostructures or repeating the tedious fabricating procedures. Due to the increase in damping plasmonic

resonance with increasing the thickness of the adhesion, we suggest the BMN 673 purchase suitable adhesion of Ti layer below 5 nm and of Cr below 2 nm. Acknowledgements This work was supported by the Chinese National Science and Technology Plan 973 with Grant No. 2007CB935301. Disclosure This article is distributed under the terms of the Creative Commons Attribution Noncommercial License which permits any noncommercial use, SN-38 purchase distribution, and reproduction GPX6 in any medium, provided the original author(s) and source are credited. Electronic supplementary material Additional file 1: Influence of nanogaps in the 3D nanostructures and reusability of the SERS substrate. (DOCX 225 KB) References 1. Jeanmaire DL, van Duyne RP: Surface Raman spectroelectrochemistry: Part

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